🟦Intel Introduces High Aperture Count EUV Lithography System

Intel Receives High NA EUV Lithography Equipment from ASML
Access Denied

🟦 Intel Introduces High Aperture Count EUV Lithography System from ASML

 Intel has received a second-generation EUV (extreme ultraviolet) lithography system from ASML. ASML and Intel have a long-standing collaboration, and they have recently introduced the latest lithography system, the TWINSCAN EXE:5200. This system features a high NA (numerical aperture) lens with an NA of 0.55, marking a significant advancement over previous EUV tools.

 While the first generation of EUV lithography systems utilized lenses with an NA of 0.33, a novel optical design in the new generation has increased the numerical aperture. This enhancement has improved the resolution and enabled high-resolution patterning in transistor functions.

Exposure device resolution

 The resolution of the exposure equipment is determined by a combination of the wavelength used (13.5 nm for EUV) and the numerical aperture (NA). The resolution is proportional to the wavelength of the exposure and inversely proportional to the number of apertures in the optical system. In other words, in order to increase the resolution, you need to increase the numerical aperture.

🟦 Redefining the Law of Wisdom

 The use of lenses with a high numerical aperture (NA) allows for higher resolution and precise patterning, enabling advances that support Moore’s Law. Through this, Intel aims to establish a competitive advantage in manufacturing technology.

 The latest lithography equipment was packed in wooden boxes of 250 pieces and delivered from the Netherlands to Hillsboro, Oregon, USA. Intel plans to use the equipment to start manufacturing in the 18A process in 2025. In addition, in the future we plan to produce at more advanced nodes.

🟦Summary

Intel Receives High NA EUV Lithography System from ASML, paving the way for regaining leadership in chip manufacturing technology. High resolution and precise patterning are possible, and Moore’s Law is expected to continue.

 Intel is lagging behind rivals TSMC and Samsung in the development of advanced processes. However, by introducing the latest equipment ahead of other companies, we are trying to catch up in technological development. This kind of aggressive strategy as a challenger is a good trend.

タイトルとURLをコピーしました