The National Institute of Advanced Industrial Science and Technology (AIST), which aims to strengthen the semiconductor industry, will establish a state-of-the-art research center to introduce Japan's first extreme ultraviolet (EUV) lithography system in cooperation with Intel in the United States.
🟦 AIST and Intel to jointly introduce Japan’s first EUV device
The National Institute of Advanced Industrial Science and Technology (AIST) has announced the introduction of Japan’s first extreme ultraviolet (EUV) lithography system and the establishment of a state-of-the-art semiconductor research and development center. The project is supported by Intel in the U.S. and manufacturing equipment and material manufacturers in Japan and overseas, with the aim of starting operations in 2027. The EUV system is indispensable for the production of cutting-edge semiconductors with a circuit line width of 5 nm (nanometers) or less, and this is the first time that a research institute in Japan owns it.
In addition, AIST has set forth the “Semiconductor Fab Concept” and will develop a system to meet specific needs, such as automotive semiconductors, through collaboration with the automotive industry and low-volume production models.
🟦 Background to the introduction of EUV and the importance of economic security
The background to this EUV introduction plan is deeply related to the international situation, including the US-China confrontation. The U.S. restricts the export of EUV equipment to China, which complicates the procedures for transferring overseas research data and results to Japan. Therefore, there is a need for independent development of cutting-edge technologies in Japan.
In addition, EUV equipment is an expensive equipment of more than 40 billion yen for a single unit, making it difficult for many companies to purchase their own. By introducing this system, AIST will be able to create a new system in which manufacturers of manufacturing equipment and materials pay usage fees to promote research and development. In this way, technological development utilizing domestic research bases is extremely important for Japan’s economic security.
🟦 Summary
The introduction of EUV equipment in cooperation with AIST and Intel in the U.S. will bring new possibilities to the semiconductor industry in Japan. This project is an important step forward in contributing to the improvement of Japan’s technological capabilities and strengthening economic security as a research and development base for cutting-edge technologies.
The introduction of EUV in Japan was largely triggered by support from government subsidies, and companies such as Micron Hiroshima and Lapitas are making progress. In the future, it will be even more important to create new services and products that make use of Japan’s unique cutting-edge processes.
